PRODUCTS > Crystalline Silicon Battery Equipment > Mono-crystalline Batch Texturing Equipment

Mono-crystalline Batch Texturing Equipment

Equipment Name

·Mono-crystalline Batch Texturing Equipment

Equipment Model

·SC-CSZ8000E-15F

Equipment Application

·Used for texturing& cleaning of mono crystalline wafers.

Processing Steps

·Saw damage removal→Pre-cleaning→Mono-texturing→Post cleaning→Acid cleaning→Hot water drying→Drying (for reference only)

Features

· Throughput: 400PCS/batch, 8000PCS/H.

· Process Bath circulation volume adjustable.

· Uniform pyramids texture, etch depth adjustable. 

· Wafer thickness down to 120μm.

· With clean dry area and self-clean dry system.

· H2O2 free.

· Quick inline bath change.

· Suitable with MES, RFID and inline weight testing optional.


Parameters


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